发明名称 Ferroelectric capacitor having three-dimensional structure, nonvolatile memory device having the same and method of fabricating the same
摘要 A ferroelectric capacitor having a three-dimensional structure, a nonvolatile memory device having the same, and a method of fabricating the same are provided. The ferroelectric capacitor may include a trench-type lower electrode, at least one layer formed around the lower electrode, a ferroelectric layer (PZT layer) formed on the lower electrode and the at least one layer and an upper electrode formed on the ferroelectric layer. The at least one layer may be at least one insulating interlayer and the at least one layer may also be at least one diffusion barrier layer. The at least one layer may be formed of an insulating material excluding SiO2 or may have a perovskite crystal structure excluding Pb.
申请公布号 US7910967(B2) 申请公布日期 2011.03.22
申请号 US20060515024 申请日期 2006.09.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN SANG-MIN;PARK YOUNG-SOO;KOO JUNE-MO;BAE BYOUNG-JAE;SONG I-HUN;KIM SUK-PIL
分类号 H01L21/00;H01L23/48;H01L31/112 主分类号 H01L21/00
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