发明名称 |
Phosphor coating method for fabricating light emitting semiconductor device and applications thereof |
摘要 |
A phosphor coating method for fabricating a light-emitting semiconductor is provided. The phosphor coating method comprises the steps as follows: First a light emitting semiconductor wafer having a plurality of die units formed thereon is provided, and a photoresist is then formed on the light emitting semiconductor wafer to cover the die units. A pattern process is conducted to form a plurality of openings associated with the die units, whereby each die can be exposed via one of the openings. Subsequently, a compound mixed with phosphor is filled into the openings.
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申请公布号 |
US7910387(B2) |
申请公布日期 |
2011.03.22 |
申请号 |
US20070984775 |
申请日期 |
2007.11.21 |
申请人 |
EVERLIGHT ELECTRONICS CO., LTD. |
发明人 |
CHAO TZU-HAO |
分类号 |
H01L21/00;H01L33/00;H01L33/38;H01L33/50;H01L33/62;H01L33/64 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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