发明名称 Semiconductor storage element and manufacturing method thereof
摘要 A semiconductor storage element includes: a semiconductor layer constituted of a line pattern with a predetermined width formed on a substrate; a quantum dot forming an electric charge storage layer formed on the semiconductor layer through a first insulating film serving as a tunnel insulating film; an impurity diffusion layer formed in a surface layer of the semiconductor layer so as to sandwich the quantum dot therebetween; and a control electrode formed on the quantum dot through a second insulating film.
申请公布号 US7910977(B2) 申请公布日期 2011.03.22
申请号 US20070947428 申请日期 2007.11.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KAWABATA KENJI
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
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