| 摘要 |
Varying the optical absorption of an electrochromic device in situ allows optimal control over the depth and quality of laser patterning lines when patterning electrochromic devices. Accordingly, an electrochromic device comprises a target conductive layer, an absorbing electrochromic layer formed below the target layer, and an electrolyte layer formed below the absorbing electrochromic layer. The absorbing electrochromic layer is placed in a darkened state, and the target layer is laser ablated using a wavelength that is minimally absorbed in the target layer and a fluence level that does not ablate layers of the electrochromic device that are below the absorbing electrochromic layer. The absorbing electrochromic layer is placed in the darkened state by applying a predetermined control voltage to the electrochromic device, forming the electrochromic device by dark-state deposition, or forming an electrochromic device that is in its darkened state in an equilibrium state.
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