发明名称 Method for manufacturing semiconductor device
摘要 A method for manufacturing a semiconductor device, including: (a) forming an energy cured resin layer on a semiconductor substrate having an electrode pad and a passivation film; (b) fusing the resin layer without being cured and shrunk by a first energy supply processing; (c) forming a resin boss by curing and shrinking the resin layer after fusion by a second energy supply processing; and (d) forming an electrical conducting layer which is electrically connected to the electrode pad and passes through over the resin boss.
申请公布号 US7910498(B2) 申请公布日期 2011.03.22
申请号 US20060425826 申请日期 2006.06.22
申请人 SEIKO EPSON CORPORATION 发明人 YAMASAKI YASUO;TANAKA SHUICHI;HASHIMOTO NOBUAKI
分类号 H01L21/31 主分类号 H01L21/31
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