| 发明名称 |
Sequential pulse deposition |
| 摘要 |
A method for growing films on substrates using sequentially pulsed precursors and reactants, system and devices for performing the method, semiconductor devices so produced, and machine readable media containing the method.
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| 申请公布号 |
US7910177(B2) |
申请公布日期 |
2011.03.22 |
| 申请号 |
US20060496093 |
申请日期 |
2006.07.31 |
| 申请人 |
MOSAID TECHNOLOGIES INCORPORATED |
发明人 |
LI WEIMIN |
| 分类号 |
C23C8/00;C23C16/44;C23C16/455;H01L21/20;H01L21/285;H01L21/314;H01L21/44;H01L27/01 |
主分类号 |
C23C8/00 |
| 代理机构 |
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代理人 |
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