| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
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| 申请公布号 |
US7911586(B2) |
申请公布日期 |
2011.03.22 |
| 申请号 |
US20090412437 |
申请日期 |
2009.03.27 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GUI CHENG-QUN;BLEEKER ARNO JAN;DE JAGER PIETER WILLEM HERMAN |
| 分类号 |
G03B27/54;G02B26/12;G03B27/32;G03B27/42;G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/54 |
| 代理机构 |
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代理人 |
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