发明名称 METHOD OF REMOVING SURFACE DAMAGE OF SOLAR CELL DUE TO PLASMA DRY ETCH AND MANUFACTURING METHOD OF SOLAR CELL BY USING THE SAME
摘要 PURPOSE: A solar cell surface damage removing method and a solar cell manufacturing method using the same are provided to improve the process efficiency remarkably by preventing the surface damage of the solar cell with simple method of dipping a solar cell substrate in the nitride solution. CONSTITUTION: An emitter layer(110) is formed by injecting the impurity material of second conductive type into a substrate(100). A front side reflection barrier layer(120) is formed on the emitter layer in order to lower the reflectivity of sunlight. A front electrode is formed to pass through the front side reflection barrier layer and contact the emitter layer.
申请公布号 KR20110028947(A) 申请公布日期 2011.03.22
申请号 KR20090086598 申请日期 2009.09.14
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 YI, JUN SIN;JUNG, WOO WON;YANG, DOO HWAN;KIM, SUN YONG;LEE, YONG WOO;KWON, TAE YOUNG;KYEONG, DO HYEON;JANG, KYUNG SOO
分类号 H01L31/04;H01L31/18 主分类号 H01L31/04
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