| 摘要 |
<p>The device (30) has a volume limited by a sealed wall divided into upper and lower parts (31, 32) by a sealed partition (33), and a main wall comprising a set of openings (37) e.g. rectangular slots. The upper and lower parts are provided with purging gas inlet and outlet orifices (34, 35), respectively. The main wall cooperates with an input/output opening of a transporting box, and is perpendicular to planes of substrate wafers in the box. Median plane of the openings (37) is parallel to the planes of the wafers. The openings (37) connect the volume of the device to the box. Independent claims are also included for the following: (1) a drain system for a transporting box, comprising a chamber with a connection orifice (2) a drain method for a transporting box.</p> |
