| 摘要 |
PURPOSE: A sputtering apparatus using an external multi discharge tube is provided to efficiently consume a target through uniformly induced plasma by inducing plasma into a process chamber using an external discharge tube and an antenna coil. CONSTITUTION: An external discharge tube(130) forms a discharge loop in a process chamber(120). An antenna coil(160) generates an electromotive force for generating plasma by receiving a power frequency from a power supply source. A target(170) is located on the process chamber. The target is ionized by plasma induced by the external discharge tube and is deposited on a substrate to be processed. An impedance matching machine(152) is installed between the power supply source and the antenna coil.
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