发明名称 NITRIDING TREATMENT DEVICE AND NITRIDING TREATMENT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a nitriding treatment device which can perform nitriding treatment for a workpiece requiring not only complicated shape but also high dimensional shape precision. <P>SOLUTION: The nitriding treatment device uses an electron beam excitation plasma device 1 including: an electron beam gun 10 generating an energy-controlled electron beam; and a treatment tank 2 making the introduced gaseous nitrogen into nitrogen plasma by the electron beam emitted from the electron beam gun 10. The prescribed position in the treatment tank 20 is provided with a metallic network cage 30 whose inside can be disposed with a workpiece 40. The nitriding treatment device is provided with: a first DC power source apparatus 41 capable of applying the bias voltage at a positive potential higher than the plasma potential in the position disposed with the workpiece 40 to the workpiece 40; and a second DC power source apparatus 31 capable of applying bias voltage at a negative potential to the cage 30. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011052313(A) 申请公布日期 2011.03.17
申请号 JP20090204866 申请日期 2009.09.04
申请人 MEIJO UNIV 发明人 PETROS ABRAHA;YOSHIKAWA YASUHARU
分类号 C23C8/36;C21D1/06 主分类号 C23C8/36
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