发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To increase an aperture ratio of a semiconductor device using an oxide semiconductor. <P>SOLUTION: The semiconductor device includes a driver circuit including a first thin film transistor and a pixel including a second thin film transistor over one substrate. The first thin film transistor includes a first gate electrode layer, a gate insulating layer, a first oxide semiconductor layer, a first oxide conductive layer, a second oxide conductive layer, an oxide insulating layer which is in contact with part of the first oxide semiconductor layer and which is in contact with peripheries and side surfaces of the first and second oxide conductive layers, a first source electrode layer, and a first drain electrode layer. The second thin film transistor includes a second gate electrode layer, a second oxide semiconductor layer, and a second source electrode layer and a second drain electrode layer each formed using a light-transmitting material. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011054949(A) 申请公布日期 2011.03.17
申请号 JP20100175003 申请日期 2010.08.04
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;SAKATA JUNICHIRO;HOSOHANE MIYUKI;TAKAHASHI TATSUYA
分类号 H01L29/786;G02F1/1345;G02F1/1368;G09F9/30;H01L21/28;H01L21/336;H01L51/50 主分类号 H01L29/786
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