| 摘要 |
PROBLEM TO BE SOLVED: To enable a meniscus to recover utilizing a surface tension of liquid, and to suppress an elongation of a cleaning term. SOLUTION: A cleaning means is provided which completes wiping processing of a large surface tension liquid jetting region (nozzle formation surface 3A set in the large surface tension liquid jetting region in step S1) prior to a small surface tension liquid jetting region (nozzle formation surface 3A set in the small surface tension liquid jetting region in step S1). A control device 37 sets a waiting time after wiping processing when determining that there exists no nozzle formation surface 3A not passed through wiping processing in step S4 (step S5). The control device 37 completes cleaning processing after waiting for a time after the completion of all wiping processing to be the waiting time set in step S5 (step S6). A time up to the completion of wiping processing of the small surface tension liquid jetting region can be assigned to a part of a recovery time of the meniscus in the large surface tension liquid jetting region. COPYRIGHT: (C)2011,JPO&INPIT |
