| 摘要 |
The present invention relates to a method for regulating an active vibration isolation system and to an active vibration isolation system, in particular for a vibration isolated positioning of lithography-devices, wafer-handling-systems and/or microscopes, as for instance scanning microscopes. The active vibration isolation system comprises the following components: a support body for bearing a load which is to be isolated; pneumatic vibration isolators with controllable valves for carrying the support body with respect to the ground; position sensors for providing vertical position signals of the support body; a first regulating system for vibration compensation in at least one degree of freedom in translation (Xt,Yt,Zt) and in at least one degree of freedom in rotation (Xr,Yr,Zr) and a second pneumatic regulating system for vibration compensation in at least one degree of freedom selected from three degrees of freedom (Zt,Xr,Yr) which are effective in vertical direction.
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