| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an etching method capable of precisely controlling depth in micromachining of not more than a wavelength of light, and to provide a method of manufacturing a mold for nanoimprint utilizing an etching method, an inspection method, and etching equipment. <P>SOLUTION: When etching a base material (1) via an etching mask (2) having an opening (3), a relation expression between an amount of decrease (a-b) of the etching mask (2) and an etching depth (d) of the base material (1) by etching is set previously, and the corresponding etching depth (d) is calculated from the relation expression by measuring the amount of decrease (a-b) in the etching mask (2), thus controlling etching. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
