发明名称 SOLID-STATE IMAGING APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To accomplish a solid-state imaging apparatus in which smear characteristics are enhanced and vignetting of incident light by a light shielding film is reduced. SOLUTION: The solid-state imaging apparatus includes a light receiving section 103 and a transfer channel 105 formed on a semiconductor substrate 101, a transfer electrode 121 formed on the transfer channel 105, an antireflection film 123 formed on the light receiving section 103, and a light shielding film 125 which covers the transfer electrode 121 and comes into contact with a side surface of the antireflection film 123. An upper surface of the light shielding film 125 in a portion, where the light shielding film 125 and the side surface of the antireflection film 123 come into contact with each other, is positioned lower than the upper surface of the light shielding film on the transfer electrode. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011054904(A) 申请公布日期 2011.03.17
申请号 JP20090205038 申请日期 2009.09.04
申请人 PANASONIC CORP 发明人 TANAKA KOJI
分类号 H01L27/14;H01L27/148;H04N5/335 主分类号 H01L27/14
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