发明名称 SEMIPOLAR NITRIDE-BASED DEVICES ON PARTIALLY OR FULLY RELAXED ALLOYS WITH MISFIT DISLOCATIONS AT THE HETEROINTERFACE
摘要 A dislocation-free high quality template with relaxed lattice constant, fabricated by spatially restricting misfit dislocation(s) around heterointerfaces. This can be used as a template layer for high In composition devices. Specifically, the present invention prepares high quality InGaN templates (In composition is around 5-10%), and can grow much higher In-composition InGaN quantum wells (QWs) (or multi quantum wells (MQWs)) on these templates than would otherwise be possible.
申请公布号 US2011064103(A1) 申请公布日期 2011.03.17
申请号 US20100861532 申请日期 2010.08.23
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 OHTA HIROAKI;WU FENG;TYAGI ANURAG;CHAKRABORTY ARPAN;SPECK JAMES S.;DENBAARS STEVEN P.;NAKAMURA SHUJI;YOUNG ERIN C.
分类号 H01S5/343;B82Y20/00;C30B23/02;C30B25/02;H01L33/04 主分类号 H01S5/343
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