发明名称 |
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND INSPECTION/PERIPHERY EXPOSURE APPARATUS |
摘要 |
An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.
|
申请公布号 |
US2011063588(A1) |
申请公布日期 |
2011.03.17 |
申请号 |
US20100870402 |
申请日期 |
2010.08.27 |
申请人 |
KASHIYAMA MASAHITO;INAGAKI YUKIHIKO;AKIYAMA KAZUYA;YOKONO NORIAKI;TANIGUCHI ISAO |
发明人 |
KASHIYAMA MASAHITO;INAGAKI YUKIHIKO;AKIYAMA KAZUYA;YOKONO NORIAKI;TANIGUCHI ISAO |
分类号 |
G03B27/32 |
主分类号 |
G03B27/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|