发明名称 MANUFACTURING METHOD OF COMPOUND SEMICONDUCTOR MATERIAL, AND COMPOUND SEMICONDUCTOR MATERIAL USING THE SAME
摘要 The present invention provides a manufacturing method of group III-V compound semiconductor material including a step of making a metal oxide nano-particle of a group III metal element reductively react to a group-V-element-containing compound in order to manufacture compound semiconductor material comprised of two or more element compounds.
申请公布号 US2011062391(A1) 申请公布日期 2011.03.17
申请号 US20090627312 申请日期 2009.11.30
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KIM JAE IL;HAM SUK JIN;CHO DONG HYUN;LEE IN HYUNG
分类号 H01B1/04 主分类号 H01B1/04
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