| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition which is excellent in sensitivity, resolution, roughness properties and temporal stability and enables to form a pattern of good configuration, and to provide a pattern forming method using the same. <P>SOLUTION: The actinic ray- or radiation-sensitive resin composition includes a resin having a structure represented by general formula (I), and a compound which generates an acid upon irradiation with actinic rays or radiation. <P>COPYRIGHT: (C)2011,JPO&INPIT |
