| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of preparing a resist pattern excellent in sensitivity. <P>SOLUTION: The resist composition contains a photoradical generating agent, an acid generating agent, and a resin having a group unstable to an acid, insoluble or slightly soluble in an aqueous alkaline solution, and dissolved in the aqueous alkaline solution after the acid acts on the resin, and this pattern forming method includes (1) a step of applying the resist composition onto a substrate, (2) a step of removing a solvent from the composition after applied, to form a composition layer, (3) a step of exposing the composition layer to a light, using an exposure machine, (4) a step of heating the composition layer after exposed, and (5) a step of developing the composition layer after heated, using a developing device. <P>COPYRIGHT: (C)2011,JPO&INPIT |
