| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin for a resist composition capable of preparing a resist pattern having an excellent line edge roughness and an excellent top shape. <P>SOLUTION: The resin is provided which has a structure unit originating in a compound expressed by formula (a1) wherein R<SP>a1</SP>represents a hydrogen atom, a halogen atom or an alkyl group, R<SP>a2</SP>represents a perfluoro adamantyl group, a monohydroxy-tetradecafluoro adamantyl group, a perfluoro cyclohexyl group or a monohydroxy-deca fluoro cyclohexyl group. L<SP>a1</SP>represents a single bond or an alicyclic hydrocarbon group, and L<SP>a2</SP>represents a single bond, an alkanediyl group or the like. <P>COPYRIGHT: (C)2011,JPO&INPIT |
