METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a resist pattern designed to reduce a manufacturing cost by improving efficiency in the use of a resist material, to provide a method for removing a resist pattern, and to provide a method for manufacturing a semiconductor device. SOLUTION: This invention includes a step of forming the resist pattern by discharging a composition containing a photosensitizer on an object to be processed under reduced pressure. This invention includes a step of etching the object to be processed using the resist pattern as a mask, a step of irradiating the resist pattern through a photomask with light within a photosensitive wavelength region of the photosensitizer, and a step of removing the resist pattern on the object to be processed. COPYRIGHT: (C)2011,JPO&INPIT