| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition and a resist pattern forming method using the resist composition. <P>SOLUTION: The resist composition contains a base material component (A) whose solubility for an alkaline developer changes due to action of acid, an acid generating agent component (B) generating acid due to exposure, and a nitrogen-containing organic compound component (D). The nitrogen-containing organic compound component (D) contains a compound denoted by formula (d1). In the formula, R<SP>20</SP>denotes a methylene group, an ethylene group, an oxygen atom or C(CH<SB>3</SB>)<SB>2</SB>, R<SP>21</SP>denotes a hydrogen atom or an organic group, and R<SP>22</SP>denotes an alkoxy group, an alkocarbonyloxy group, a hydroxy group, a halogen atom, C(=O)-O-R<SP>23</SP>, C(=O)-NH-R<SP>23</SP>or a carboxy group. In the formula, R<SP>23</SP>denotes a 1-15C direct chain or branched chain alkyl group, an unsaturated hydrocarbon group, an aliphatic ring group or an aromatic group, a denotes an integer of 0-2. <P>COPYRIGHT: (C)2011,JPO&INPIT |
