APPARATUS FOR GENERATING HOLLOW CATHODE PLASMA AND APPARATUS FOR TREATING SUBSTRATE BY HOLLOW CATHODE PLASMA

摘要

PURPOSE: A plasma generating device and a substrate processing device are provided to increase a hollow cathode effect and an electron emitting effect by a hollow cathode and a needle arranged in an inner groove of the hollow cathode, thereby providing plasma of high density. CONSTITUTION: A substrate support member(130) is arranged in a processing chamber to support a substrate(W). A plurality of inner grooves from which plasma is generated is formed on one side of a hollow cathode(140). A plurality of needles(150) is fixed to the inner grooves. A power supply source(162) is electrically connected to the hollow cathode. An insertion hole penetrates the needles and the hollow cathode.