| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stage apparatus, an exposure apparatus, a cleaning method and a device manufacturing method, that can suppress an exposure defect. <P>SOLUTION: A substrate holding part 5 of a substrate stage 2 has a liquid supply port 3 which can be connected to a liquid supply apparatus 7. The liquid supply apparatus 7 can supply a liquid to a chuck surface 5a through the liquid supply port 3. <P>COPYRIGHT: (C)2011,JPO&INPIT |
