| 摘要 |
A sputtering device includes a housing, two baffles, a pair of conveyor, and a support. The housing includes a chamber therein. The baffles are slidably installed in the chamber of the housing to divide the chamber of the housing into a number of separated rooms where workpieces are treated. The baffles are slideable relative to the housing between a first position where the rooms are isolated and sealed by the baffles from others, and a second position where the rooms communicate with each other. The support is received in the housing. The pair of conveyor is mounted on the housing for transporting the support from one of the rooms to another.
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