| 发明名称 |
CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN |
| 摘要 |
<p>A cyclic compound represented by general formula (1) [wherein L, R1, R' and m are each as defined in the description]. The cyclic compound exhibits high solubility in a safe solvent and high sensitivity and can yield an excellent resist pattern shape, thus being useful as a component of a radiation-sensitive composition.</p> |
| 申请公布号 |
WO2011030683(A1) |
申请公布日期 |
2011.03.17 |
| 申请号 |
WO2010JP64683 |
申请日期 |
2010.08.30 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;HAYASHI, HIROMI;ECHIGO, MASATOSHI;OGURO, DAI |
发明人 |
HAYASHI, HIROMI;ECHIGO, MASATOSHI;OGURO, DAI |
| 分类号 |
C07C39/17;C07C37/20;C07C47/546;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C39/17 |
| 代理机构 |
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