发明名称 MOSFET with a Nanowire Channel and Fully Silicided (FUSI) Wrapped Around Gate
摘要 Nanowire-channel metal oxide semiconductor field effect transistors (MOSFETs) and techniques for the fabrication thereof are provided. In one aspect, a MOSFET includes a nanowire channel; a fully silicided gate surrounding the nanowire channel; and a raised source and drain connected by the nanowire channel. A method of fabricating a MOSFET is also provided.
申请公布号 US2011062411(A1) 申请公布日期 2011.03.17
申请号 US20090561694 申请日期 2009.09.17
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BANGSARUNTIP SARUNYA;COHEN GUY
分类号 H01L29/12;H01L21/336;H01L21/762 主分类号 H01L29/12
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