发明名称 |
METHOD OF MANUFACTURING SUBSTRATE WITH THROUGH ELECTRODE, AND SUBSTRATE WITH THROUGH ELECTRODE |
摘要 |
PROBLEM TO BE SOLVED: To provide a means of efficiently manufacturing a substrate with a through electrode to be used for high-density packaging of a chip device. SOLUTION: Manufacturing processes of the substrate with the through electrode includes: a process of suspending particulates of a conductor material constituting the through electrode in a liquid; a process of bringing a filter layer 140 that the particulates of the conductive material do not pass through and only the liquid can pass through into contact with one surface of a substrate 101 having a through hole 102; a process of pouring the suspension 130 in the through hole while applying pressure to deposit the conductor particulates in the through hole; a process of drying the liquid wetting the conductor particulates deposited in the through hole; and a process of injecting conductive paste into the through hole wherein the conductor particulates are deposited, and then drying and hardening them. A method of forming a through electrode by using particulates made of alloy as the conductor particulates and melting them at a temperature above the melting point of the alloy, and cooling and solidifying them is available. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011054907(A) |
申请公布日期 |
2011.03.17 |
申请号 |
JP20090205108 |
申请日期 |
2009.09.04 |
申请人 |
CHEMITORONICS CO LTD;MEMS CORE CO LTD |
发明人 |
HONMA YASUYUKI;MIYAZAKI MASARU |
分类号 |
H01L23/15;B05D1/18;B05D5/12;H01L21/288;H01L21/3205;H01L23/14;H01L23/52;H05K3/40 |
主分类号 |
H01L23/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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