发明名称 LIQUID PROCESSING APPARATUS FOR SUBSTRATE, METHOD FOR GENERATING PROCESSING LIQUID AND COMPUTER READABLE RECORDING MEDIUM STORING PROGRAM FOR GENERATING PROCESSING LIQUID THEREIN
摘要 PURPOSE: A liquid processing apparatus of a substrate, a method for generating processing liquid, and a computer readable recording medium storing a program for generating processing liquid are provided to generate processing liquid of a preset concentration and to supply the processing liquid to a substrate processing unit, thereby uniformly processing a substrate. CONSTITUTION: A plurality of substrate processing units(11~22) processes a substrate(2) using processing liquid. A processing liquid generating unit(24) generates processing liquid of a preset concentration by dissolving a gas in a solvent. The processing liquid generating unit comprises a solvent supply pipe(35) and a dissolution flow path(36) for supplying the solvent. The dissolution flow path dissolves the gas in the solvent supplied from the solvent supply pipe. A controller(25) controls the substrate processing units and the processing liquid generating unit.
申请公布号 KR20110028220(A) 申请公布日期 2011.03.17
申请号 KR20100084393 申请日期 2010.08.30
申请人 TOKYO ELECTRON LIMITED 发明人 ESHIMA KAZUYOSHI
分类号 H01L21/302;H01L21/3063 主分类号 H01L21/302
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