发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: A method for manufacturing a semiconductor device is provided to form a protective film with a fixed width expanded along an external end, thereby preventing teeth missing of the semiconductor substrate. CONSTITUTION: A surface protection tape(13) is attached to a surface(1a) of a semiconductor substrate(1). The semiconductor substrate is absorbed by a wafer absorbing layer installed on a chuck stage(17). Mixed acid is discharged toward a rear side(1b) of the semiconductor substrate through a chemical liquid discharging nozzle(9). The mixed acid flows toward an external end of the semiconductor substrate by a centrifugal force. A fracturing layer of the semiconductor substrate is removed by the mixed acid.
申请公布号 KR20110027575(A) 申请公布日期 2011.03.16
申请号 KR20100085211 申请日期 2010.09.01
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 NAKATA KAZUNARI;MOTONAMI KAORU;NARAZAKI ATSUSHI;ONOYAMA AYUMU;HONDA SHIGETO;FUJII RYOICHI;HIRATA TOMOYA
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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