发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A method for manufacturing a semiconductor device is provided to form a protective film with a fixed width expanded along an external end, thereby preventing teeth missing of the semiconductor substrate. CONSTITUTION: A surface protection tape(13) is attached to a surface(1a) of a semiconductor substrate(1). The semiconductor substrate is absorbed by a wafer absorbing layer installed on a chuck stage(17). Mixed acid is discharged toward a rear side(1b) of the semiconductor substrate through a chemical liquid discharging nozzle(9). The mixed acid flows toward an external end of the semiconductor substrate by a centrifugal force. A fracturing layer of the semiconductor substrate is removed by the mixed acid. |
申请公布号 |
KR20110027575(A) |
申请公布日期 |
2011.03.16 |
申请号 |
KR20100085211 |
申请日期 |
2010.09.01 |
申请人 |
MITSUBISHI ELECTRIC CORPORATION |
发明人 |
NAKATA KAZUNARI;MOTONAMI KAORU;NARAZAKI ATSUSHI;ONOYAMA AYUMU;HONDA SHIGETO;FUJII RYOICHI;HIRATA TOMOYA |
分类号 |
H01L21/304;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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