| 摘要 |
There is provided a power supply apparatus that is capable of suppressing the occurrence of anomalous electric discharge due to charge-up of a substrate and that is capable of forming a good thin film on a large-area substrate. The power supply apparatus of this invention has: a first discharge circuit that alternately charges predetermined potential at a predetermined frequency to a pair of targets that are in contact with a plasma; and a second discharge circuit that charges predetermined potential between the grounding and the electrode, out of the pair of electrodes, that is not charged with potential from the first discharge circuit. The second discharge circuit is provided with a reverse potential charging means for charging, at the time of polarity reversal, at least one of the electrodes with potential that is reverse to the output potential. |
