Complex appatatus for etching and etching system of the same,申请号KR20080118217-传众专利搜索

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发明名称	Complex appatatus for etching and etching system of the same
摘要
申请公布号	KR101021931(B1)	申请公布日期	2011.03.16
申请号	KR20080118217	申请日期	2008.11.26
申请人		发明人
分类号	H01L21/3063;H01L21/306	主分类号	H01L21/3063
代理机构		代理人
主权项
地址

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