发明名称 SEMICONDUCTOR COMPONENT AND METHOD FOR MANUFACTURING OF THE SAME
摘要 <p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to prevent the deterioration of a device property due to electric field concentration by including a field plate which distributes an electric field concentrated on a gate electrode and a drain electrode. CONSTITUTION: A semiconductor layer(120) is formed on a base substrate(110). The semiconductor layer comprises a lower layer(122) and an upper layer(126) which are successively laminated on the base substrate. A recess structure(130) is formed on the upper layer. A gate structure covers the recess structure. A source electrode(152) and a drain electrode(154) are separated while interposing the gate structure on the semiconductor layer.</p>
申请公布号 KR20110026798(A) 申请公布日期 2011.03.16
申请号 KR20090084593 申请日期 2009.09.08
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK, KI YEOL;LEE, JUNG HEE;HA, JONG BONG;PARK, YOUNG HWAN;JEON, WOO CHUL
分类号 H01L29/78;H01L21/8252 主分类号 H01L29/78
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