SEMICONDUCTOR COMPONENT AND METHOD FOR MANUFACTURING OF THE SAME
摘要
<p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to prevent the deterioration of a device property due to electric field concentration by including a field plate which distributes an electric field concentrated on a gate electrode and a drain electrode. CONSTITUTION: A semiconductor layer(120) is formed on a base substrate(110). The semiconductor layer comprises a lower layer(122) and an upper layer(126) which are successively laminated on the base substrate. A recess structure(130) is formed on the upper layer. A gate structure covers the recess structure. A source electrode(152) and a drain electrode(154) are separated while interposing the gate structure on the semiconductor layer.</p>
申请公布号
KR20110026798(A)
申请公布日期
2011.03.16
申请号
KR20090084593
申请日期
2009.09.08
申请人
SAMSUNG ELECTRO-MECHANICS CO., LTD.
发明人
PARK, KI YEOL;LEE, JUNG HEE;HA, JONG BONG;PARK, YOUNG HWAN;JEON, WOO CHUL