DEPOSITION APPARATUS AND INSECTION METHOD OF A LAYER

摘要

PURPOSE: A deposition apparatus and a film inspection method are provided to enable the surface of a film on an actual active region to be indirectly measured since only a test pattern of a film on the dead space of a substrate is inspected by a surface analyzer. CONSTITUTION: A deposition apparatus comprises at least one film deposition chamber(110), a transfer chamber(120), and a surface analyzing chamber(130). The film deposition chamber deposits a film on a substrate(100). The transfer chamber transfers the substrate. The surface analyzing chamber is connected to the film deposition chamber and the transfer chamber. The surface analyzing chamber comprises a surface analyzing unit(135).