| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin excellent in resist application, which allows adequate curing of an exposed portion even under low-energy UV irradiation conditions and enables to obtain an objective developed pattern at high speed. <P>SOLUTION: The resin has an unsaturated bond group introduced by a structure which can be obtained by reacting a hydroxyl group end-blocked hyperbranched structure with an anhydrous acid compound and a glycidyl (meth)acrylate compound. A resin composition and a resist agent are also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
