| 摘要 |
<p>PURPOSE: Photo-sensitive polymer and a photo-resist composition including the same are provided to reduce the non-uniformity of the photo-sensitive polymer by easily controlling the molecular weight of the photo-sensitive polymer. CONSTITUTION: Photo-sensitive polymer is represented by chemical formula 1. In the chemical formula 1, R1, R2, and R3 are hydrogen or a methyl group. A is C2 to C120 linear or branched alkyl group, in which a part or whole hydrogen atoms are substituted fluorine, with or without an ester group. X is C1 to C40 linear, branched, monocyclic, or polycyclic alkyl group. Y is C1 to C40 linear, branched, monocyclic, or polycyclic alkyl group with a lactone group. Z isC1 to C40 linear, branched, monocyclic, or polycyclic alkyl group, capable of being substituted with a hydroxyl group, or a hydroxyl group and a halogen group, with an ether group or an ester group. n is 1 to 15 of integer.</p> |
