发明名称 INSPECTION METHOD OF PHOTO MASK, MANUFACTURING METHOD OF PHOTO MASK, MANUFACTURING METHOD OF ELECTRONIC DEVICE, TEST MASK AND TEST MASK SET
摘要 <p>PURPOSE: A method for inspecting a photo mask, a method for manufacturing a photo mask, a method for manufacturing an electronic part, a test mask, and a test mask set are provided to use a support unit with a mask which supports a photo mask to distribute the weight of the photo mask to support points, thereby preventing damage of the photo mask. CONSTITUTION: A photo mask(3) is supported by a support unit(3a) with a mask. A light source(1) uses one of a halogen lamp, a metal halide lamp, and a UHP lamp. An illumination optical system(2) irradiates inspection light to the photo mask supported by the support unit. The illumination optical system includes an iris device(2a) to vary the number of openings. The inspection light irradiated to the photo mask is transmitted through the photo mask and incident on an objective lens system(4).</p>
申请公布号 KR20110027731(A) 申请公布日期 2011.03.16
申请号 KR20110009719 申请日期 2011.01.31
申请人 HOYA CORPORATION 发明人 NAKANISHI KATSUHIKO;YOSHIDA KOICHIRO
分类号 H01L21/66;G01N21/956;G03F1/84;H01L21/027 主分类号 H01L21/66
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