| 摘要 |
A method of texturing a glass surface is disclosed, the method comprising the steps of coating the glass surface with a material film, stimulating a reaction at the interface between the glass and the material film resulting in the formation of reaction products at the interface, and removing the material film and the reaction products from the glass surface. In a preferred embodiment, an aluminium film around 500nm thick aluminosilicate is coated onto the glass and the stimulation is by heating. The aluminium reacts with the silica at temperatures between 500°C and 630°C to form reaction products that are then removed, along with the film, by etching with phosphoric acid. A further etch using HF/HNO 3 may also be employed. The method is particularly useful in etching glass substrates intended for use in photovoltaic devices. |
