CLEANER FOR WAFER CONTAINER

摘要

PURPOSE: An apparatus for cleaning wafer containers is provided to enable convenient cleaning of wafer containers because a wafer container is supported to slide in a container holder. CONSTITUTION: An apparatus for cleaning wafer containers comprises a case(10), a rotor(20), a plurality of container holders(22), and a cleaning solution spray nozzle(40). The rotor is installed in a cleaning chamber(14) of the case. The container holders support a container body(1) and a container cover(3) together. The cleaning solution spray nozzle sprays cleaning solution on the container body and the container cover supported on the container holders. The container holder includes a support tray having a container body supporting part and a container cover supporting part. The container body and the container cover can be supported or drawn out in a ready position of the support tray and be cleaned in a cleaning position of the support tray.