APPRATUS FOR TREATING SUBSTRATE INCLUDING SUBSTRATE PLACING MEANS AND METHOD FOR TREATING SUBSTRATE USING THE SAME

摘要

PURPOSE: A substrate processing device including a substrate receiving unit and a substrate processing method using the same are provided to reduce power consumption of a cooling unit installed in a gas distribution unit by minimizing heat from a disk of a non-receiving unit. CONSTITUTION: A disk(128) is divided into a receiving unit(136) with a plurality of insertion parts and a non-receiving unit(138). A plurality of susceptors(132) are installed on the plurality of insertion parts. A cover(140) including carbon is installed on the non-receiving unit. The cover controls the temperature distribution of the receiving unit and the non-receiving unit by a heating unit and includes a plurality of openings which receive the plurality of susceptors respectively.