SEMICONDUCTOR COMPONENT AND METHOD FOR MANUFACTURING OF THE SAME

摘要

PURPOSE: A semiconductor device and a manufacturing method thereof are provided to increase the amount of currents in an erasing operation by making the current flow through a low resistance layer with a low resistivity. CONSTITUTION: A lower layer(132) has a low resistance layer(134) and a high resistance layer(133) with high resistivity. A source electrode(150) is formed on the surface of the high resistance layer. A gate structure(160) is arranged on the surface of the low resistance layer. A drain structure(170) is arranged on the rear of the low resistance layer. A base substrate surrounds the drain structure.