| 摘要 |
An exposure head includes a substrate having a plurality of light emitting element rows each having a plurality of light emitting elements arranged in a first direction, the light emitting element rows being arranged in a second direction perpendicular or substantially perpendicular to the first direction, and an imaging optical system adapted to image light beams from the light emitting elements on an exposed surface to form respective light-collected sections, and two of the light emitting elements forming the light-collected sections adjacent to each other in the first direction are respectively disposed in the light emitting element rows different from each other, and one of the light emitting element rows is disposed so as to match or substantially match with the meridian plane of the imaging optical system.
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