发明名称 MIM capacitor structure having penetrating vias
摘要 The semiconductor device according to the present invention includes a plurality of capacitance elements. Each capacitance element has a structure obtained by holding a capacitance film made of an insulating material between first and second electrodes made of a metallic material. The first and second electrodes are so arranged as to partially overlap each other while relatively positionally deviating from each other in a direction orthogonal to the opposed direction thereof. The plurality of capacitance elements are stacked in the opposed direction.
申请公布号 US7906832(B2) 申请公布日期 2011.03.15
申请号 US20080257470 申请日期 2008.10.24
申请人 ROHM CO., LTD. 发明人 KAGEYAMA SATOSHI
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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