发明名称 Measurement system for correcting overlay measurement error
摘要 A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model, is disclosed. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method.
申请公布号 US7908105(B2) 申请公布日期 2011.03.15
申请号 US20080039479 申请日期 2008.02.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE MOON-SANG;YUM BONG-JIN;KIM HONG-SEOK;KIM KWAN-WOO;KIM SEUNG-HYUN;PARK CHAN-HOON
分类号 G06F11/00 主分类号 G06F11/00
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