发明名称 Imprint lithography
摘要 An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
申请公布号 US7906059(B2) 申请公布日期 2011.03.15
申请号 US20090404783 申请日期 2009.03.16
申请人 ASML NETHERLANDS B.V. 发明人 LOOPSTRA ERIK ROELOF;KOLESNYCHENKO ALEKSEY YURIEVICH;VAN SANTEN HELMAR
分类号 B28B1/14;B81C99/00;B27N3/08;B27N3/18;B28B3/00;B28B3/02;B28B19/00;B29C39/00;B29C41/00;B29C41/46;B29C43/02;B29C43/32;B29C51/00;B29C53/00 主分类号 B28B1/14
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