| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt achieving even better line edge roughness (LER) in a formed pattern, a resist composition comprising the salt, and a method for forming a pattern. <P>SOLUTION: The salt is constituted of an anion of 1,3-diketone and an organic cation. The resist composition comprises the salt, an acid generating agent, and a resin. The method for forming a resist pattern includes (1) a process of applying the resist composition onto a substrate, (2) a process of removing a solvent from the resist composition applied onto the substrate to form a resist composition layer, (3) a process of exposing the resist composition layer to light using an exposure device, (4) a process of heating the resist composition layer having been exposed to light, and (5) a developing process of subjecting the resist composition layer having been heated to a developing process using a developing device. <P>COPYRIGHT: (C)2011,JPO&INPIT |
