发明名称 PHOTOSENSITIVE SEMICONDUCTOR NANOCRYSTAL, PHOTOSENSITIVE COMPOSITION FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN, AND METHOD FOR FORMING PATTERN USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive semiconductor nanocrystal and a photosensitive composition for a semiconductor nanocrystal, giving easily the semiconductor nanocrystal, without requiring a troublesome process of forming a film, of using a template or the like, and a method for forming a pattern using the same. <P>SOLUTION: The semiconductor nanocrystal is surface-coordinated with a compound having a photosensitive functional group, the photosensitive composition is a composition for the semiconductor nanocrystal, and the pattern of the semiconductor nanocrystal is obtained by forming a film of the photosensitive semiconductor nanocrystal or the composition, and by exposing and developing it. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011046951(A) 申请公布日期 2011.03.10
申请号 JP20100210908 申请日期 2010.09.21
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 PARK SHOSHIN;CHO GINSHU;JUN SHIN AE;AHN TAE KYUNG;LEE SUNG-HOON
分类号 C09K11/08;G03F7/004;B82B1/00;B82Y20/00;C01B19/00;C01G11/02;C09K11/56;C09K11/62;C09K11/88;C09K11/89;G03F7/00;G03F7/027;G03F7/031;H01L21/027;H01L21/20;H01L21/36;H01L31/036;H01L35/24;H01L51/00;H01L51/46;H05B33/10;H05B33/14 主分类号 C09K11/08
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