发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which has excellent radiation transmittance, excellent solubility in a resist solvent, and exhibits high contrast. <P>SOLUTION: The resin composition contains: a polymer including a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2); and a radiation sensitive acid generator. In the formulas (1) and (2), R represents a hydrogen atom or an alkyl group of 1-5C. In the formula (1), X represents a bivalent hydrocarbon group which may include a single bond or a heteroatom, p represents 0 or 1, n represents 0 or 1, and m represents 0, 1, or 2. In the formula (2), R<SP>1</SP>represents an alkyl group of 1-4C or a monovalent alicyclic hydrocarbon group of 4-20C, and each of R2s independently represents an alkyl group of 1-4C or a monovalent alicyclic hydrocarbon group of 4-20C, or two of R<SP>2</SP>s bond each other to form an alicyclic hydrocarbon group of 4-20C together with the carbon atom to which both R<SP>2</SP>s are bonded. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011048175(A) 申请公布日期 2011.03.10
申请号 JP20090196918 申请日期 2009.08.27
申请人 JSR CORP 发明人 KAWAKAMI MINEKI;SUGIURA MAKOTO
分类号 G03F7/039;C08F220/10;H01L21/027 主分类号 G03F7/039
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